characterization of nitride coatings on high density

High temperature tribological behavior of advanced

The nitride and oxynitride coatings were deposited in N2/O2 atmosphere and bias voltage from -30 V to -100 V using medium frequency. The deposition was done at 550C on cemented carbide coupons with diameter of 50 mm and thickness 10 mm.

Boron carbide and boron carbonitride thin films as

T1 - Boron carbide and boron carbonitride thin films as protective coatings in ultra-high density hard disk drives AU - Chen, Yanfeng AU - Chung, Yip-Wah AU - Li, Shu You PY - 2006/3/31 Y1 - 2006/3/31 N2 - Boron carbide (B4C) and boron carbon nitride (Bx

Growth and characterization of aluminum nitride coatings

Growth and characterization of aluminum nitride coatings prepared by Growth and characterization of aluminum nitride coatings prepared by pulsed-direct current reactive unbalanced magnetron sputtering, H. C. Barshilia, B. Deepthi, K. S. Rajam, Thin Solid Films, 516 (2008) 4168-4174, doi: 10.1016/j.tsf.2007.10.129

Surface defects characterization and electrochemical corrosion studies of TiAlN, TiCN and AlCrN PVD coatings

resistance of various steel substrates [2]. Hard coatings impart desired properties such as low friction, thermal stability, high corrosion and oxidation resistance and high hardness into materials and tools [3]. However, despite the importance of coatings

Characterization of boron nitride thin films on silicon (100) wafer.

Maranon, Walter. Characterization of boron nitride thin films on silicon (100) wafer. Master of Science (Engineering Technology), August 2007, 69 pp, 12 tables, references, 47 titles. Cubic boron nitride (cBN) thin films offer attractive mechanical and electrical

Synthesis and Mechanical Characterization of a

Nano-grained structures are obtained for all flow ratios, with grain sizes ranging from 8.7 to 12.3 nm. At the highest nitrogen flow rates the coatings have a compressive stress of around 4.5 GPa. The (Al,Cr,Nb,Si,Ti,V)50 N50 nitride coatings have both a high

Thermal and electrical properties of silicon nitride

2017/9/29With the recent development of high power technology, power devices require higher levels of power density, efficiency, control, and conversion. 1–5 1. Y. Zhou, H. Hyuga, D. Kusano, Y. Yoshizawa, and K. Hirao, " A tough silicon nitride ceramic with high thermal

Van der Waals epitaxy and characterization of hexagonal

Li JS, Zhang CR, Li B: Preparation and characterization of boron nitride coatings on carbon fibers from borazine by chemical vapor deposition. Appl Surf Sci 2011, 257: 7752–7757. Article Google Scholar 30. Zhang XW, Boyen HG, Deyneka N

Silicon Nitride (Si3N4) Properties and Applications

Silicon nitride (Si 3 N 4) was developed in the 1960s and '70s in a search for fully dense, high strength and high toughness materials. A prime driver for its development was to replace metals with ceramics in advanced turbine and reciprocating engines to give higher operating temperatures and efficiencies.

Reduction of dislocation density of aluminium nitride buffer layer

Reduction of dislocation density of aluminium nitride buffer layer grown on sapphire substrate respectively, together with H2 as carrier gas. As illustrated in Figure 1(a), firstly a c-plane sapphire substrate with a 0.2 off-angle towards the m-direction was cleaned for 10

Thermal and electrical properties of silicon nitride

2017/9/29With the recent development of high power technology, power devices require higher levels of power density, efficiency, control, and conversion. 1–5 1. Y. Zhou, H. Hyuga, D. Kusano, Y. Yoshizawa, and K. Hirao, " A tough silicon nitride ceramic with high thermal

Synthesis and Characterization of Ti

These coatings are nanocomposite coatings of TiN nano-crystalline (black area) embedded in an amorphous matrix, which are clearly distinguished from the particles by high-resolution TEM image. The SAED patterns in the TEM analysis did not reveal any crystalline silicon nitride.

Tensile Properties and Microstructural Characterization of Hi

chemical vapor deposition with a 0.8gm layer of boron nitride (BN) followed by a 0.2 lam layer of SiC. In the as-fabricated condition, both 1-D and 2-D composites exhibited high strength and graceful failure, and showed improved properties when compared with

The effect of deposition conditions on the properties of

Amongst the reported studies on ion beam deposition methods for ZrC, ZrN and ZrCN coatings are the effect of the methane (CH 4) flow ratio on the micro-nano-structure and hardness of carbo-nitride coatings deposited on AISI 304 stainless steel, 121 ZrCN coatings deposited by a duplex process that combines ion implantation and magnetron sputtering, 104 and epitaxial growth of ZrN/W multilayers

Surface characterization of silicon nitride and silicon

article{osti_6963240, title = {Surface characterization of silicon nitride and silicon carbide powders}, author = {Rahaman, M N and Boiteux, Y and DeJonghe, L C}, abstractNote = {The nature and composition of the surfaces of silicon nitride and silicon carbide powders were investigated using high voltage and high resolution transmission electron microscopy (TEM), X-ray photoelectron

Nanocomposite Coatings: Preparation, Characterization,

2018/1/1Mitterer et al. [153] formed nitride nanocrystalline phases within a metal matrix, such as TiN in Ni [73], ZrN in Ni [74], ZrN in Cu [75,76], and CrN in Cu [77]. In these coatings, one metal may be converted into nitride in the nanocrystalline phase and the other may

Synthesis and Characterization of Ni

Synthesis and Characterization of Ni-P Coated Hexagonal Boron Nitride by Electroless Nickel Deposition K. A. Belloa,b*, M. A. Malequea, Z. Ahmada aDepartment of Manufacturing and Materials Engineering, International Islamic University Malaysia P.O. Box10, 50728, Kuala Lumpur Malaysia bDepartment of Metallurgical and Materials Engineering, Ahmadu Bello University Zaria, Nigeria e

locate surfcoat Formation of carbon nitride films by reactive high

The production of high-density plasmas with excitation of the m=0 mode helicon wave has been studied for the highly reactive sputter synthesis of carbon nitride films in N 2 and N 2 +Ar mixtures in the pressure range of ~0.1 Pa. High-density plasmas of 2

Preparation and characterization of carbon nanotube reinforced silicon nitride

Preparation and characterization of carbon nanotube reinforced silicon nitride composites Cs. Balazsia,*,Z.Konyab,F.Webera, L.P. Biroc, P. Aratoa aCeramics and Refractory Metals Laboratory, Research Institute for Technical, Physics and Materials Science, Hungarian Academy of Sciences,

Preparation and characterization of carbon nanotube reinforced silicon nitride

Preparation and characterization of carbon nanotube reinforced silicon nitride composites Cs. Balazsia,*,Z.Konyab,F.Webera, L.P. Biroc, P. Aratoa aCeramics and Refractory Metals Laboratory, Research Institute for Technical, Physics and Materials Science, Hungarian Academy of Sciences,

GaN HEMT

Gallium nitride technology in adapter and charger power supplies is a breakthrough in power density for small and lightweight, highly efficient solutions. Using Infineon's CoolGaN™ in wireless power transfer enables high efficiency at higher power levels as well as optimal tuning in class E designs.

Microstructural Characteristics and Mechanical Properties

Nanostructured and conventional TiAlN and AlCrN coatings were deposited on ASTM-SA210 Grade A-1 boiler steel. The present work has been focused to characterize the conventional thick (by plasma spraying and gas nitrided) and nanostructured thin (by physical vapor deposition process) TiAlN and AlCrN coatings developed on ASTM-SA210 Grade A-1 boiler steel. The surface morphology of the

CiteSeerX — Preparation and Characterization of

However, in previous studies, the maximum current density for preparing Ni-CeO2 nanocomposite coatings was only 5.4 A dm-2 because of the limiting current density. In this study, a high current density of 8 A dm-2 was used to prepare Ni-CeO2 nanocomposite coatings by direct current electrodeposition.

Open Research: Boron nitride nanomaterials : from

Boron nitride nanotubes (BNNTs) and ultra thin BN sheets are two of the most important next generation nanomaterials. or even inkjet printed on different substrates with any desired pattern and the ink layer is converted to a film of high density BNNTs by the

Characterization of ion beam sputtered ZrN coatings

Zirconium nitride (ZrN) coatings were prepared on Si (100) by single ion beam sputtering in N2 and Ar mixture at different substrate temperatures. Structure and morphology of the ZrN coatings were analyzed using X‐ray diffraction and atomic force microscopy. Rutherford backscattering technique was utilized for the determination of composition and thickness of the coatings. Electrical

Recent progress in the synthesis and characterization of

The best fit to the data was determined to be ZrN 0.5 and CN 1.3, assuming the density of the carbon nitride to be 1.6 10 23 atoms/cm 3 (cf. theoretical value of 1.64 10 23 atoms/cm 3). Cross-sectional Raman spectroscopy shows a transition from sp 2 to sp 3 bonding for carbon atoms when the bilayer thickness decreases from 10.3 nm to 1.6 nm ( Fig. 15 ).

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